VMV Hypoallergenics

VMV Hypoallergenics Stay On Point Skin Base Layer, 1 fl oz/30 mL

Name: VMV Hypoallergenics Stay On Point Skin Base Layer, 1 fl oz/30 mL
Brand: VMV Hypoallergenics

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Product is rated SkinSAFE 100

Product is free of the top 11 most common allergens, as determined by Mayo Clinic Research

Learn More About SkinSAFE Ratings

Ingredient information last updated on Jun 16, 2024 by SkinSAFE Team

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VMV Hypoallergenics Stay On Point Skin Base Layer, 1 fl oz/30 mL

Product is rated SkinSAFE 100

Product is free of the top 11 most common allergens, as determined by Mayo Clinic Research

Learn More About SkinSAFE Ratings

Ingredient information last updated on Jun 16, 2024 by SkinSAFE Team

Other Formulations (0 products)

How Safe is It?

Product Is

Common Preservative Free

Topical Antibiotic Free

Propylene Glycol Free

Balsam of Peru Free

Oil Free

SLS Free

Product Is Not

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Ingredients

Alumina Aluminum Stearate Aqua/Water/Eau Butylene Glycol Camellia Sinensis Leaf Extract Caprylic/Capric Triglyceride CI 77019 (Mica) CI 77491 (Iron Oxide) CI 77510 (Ferric Ferrocyanide) Citric Acid Cyclopentasiloxane glyceryl caprate Glyceryl Laurate Hydrogen Dimethicone PEG-10 Dimethicone Polyhydroxystearic Acid Sodium Phytate Titanium Dioxide Zinc Oxide

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Description

Ingredient & Allergen Review

SkinSAFE has reviewed the ingredients of VMV Hypoallergenics Stay On Point Skin Base Layer, 1 fl oz/30 mL and found it to be hypoallergenic and free of Fragrance, Gluten, Coconut, Nickel, Top Common Allergy Causing Preservatives, Lanolin, Paraben, Topical Antibiotic, MCI/MI, Soy, Propylene Glycol, Balsam of Peru, Oil, and SLS. Product is Teen Safe and Lip Safe.

Product Description

A multi-beneficial barrier-canvas and moisture-locking base for smoother-looking, more comfortable skin all day. Subtly tinted green (minerals; no dyes) to mask redness + blemishes, and to even out skin tone. Soothing antioxidants, coconut- derived monolaurin, and occlusion against irritants make it ideal for sensitive or temporarily touchy skin.