Haus Labs Triclone Skin Tech Foundation, 280 Light Medium Neutral, 1 fl oz/30 mL

Name: Haus Labs Triclone Skin Tech Foundation, 280 Light Medium Neutral, 1 fl oz/30 mL
Brand: Haus Labs by Lady Gaga

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Product is rated SkinSAFE 91

Product is 91% free of the top 11 most common allergens, as determined by Mayo Clinic Research

Learn More About SkinSAFE Ratings

Ingredient information last updated on Dec 08, 2025 by SkinSAFE Team

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Haus Labs Triclone Skin Tech Foundation, 280 Light Medium Neutral, 1 fl oz/30 mL

Product is rated SkinSAFE 91

Product is 91% free of the top 11 most common allergens, as determined by Mayo Clinic Research

Learn More About SkinSAFE Ratings

Ingredient information last updated on Dec 08, 2025 by SkinSAFE Team

Other Formulations (0 products)

How Safe is It?

Product Is

91 SkinSAFE 91

Teen SAFE

Talc Free

Common Preservative Free

Paraben Free

Lanolin Free

Coconut Free

Topical Antibiotic Free

Product Is Not

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Ingredients

1,2-Hexanediol Acrylates/ Dimethicone Copolymer acrylates/polytrimethylsiloxymethacrylate copolymer Alcohol Denat Althaea Rosea Flower Extract Aluminum Hydroxide Aqua (water, eau) Arnica Montana Flower Extract Butylene Glycol C13-15 Alkane Caprylyl Glycol CAPRYLYL METHICONE Centella Asiatica Extract Chamomilla Recutita (Matricaria) Extract CI 77891 (Titanium Dioxide) Dimethicone/Vinyl Dimethicone Crosspolymer Diphenylsiloxy Phenyl Trimethicone Disteardimonium Hectorite Dunaliella Salina Extract Ethylhexylglycerin Glycerin Glycyrrhiza Glabra (Licorice) Root Extract HEDYCHIUM CORONARIUM ROOT EXTRACT Hydrolyzed Hyaluronic Acid Iron Oxides (CI 77491, CI 77492, CI 77499) Isododecane Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone Magnesium Sulfate Methyl Trimethicone Palmitoyl Tetrapeptide-10 Panax Notoginseng Extract Perilla Ocymoides Leaf Extract Phenyl Trimethicone Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone Polymethylsilsesquioxane Polypropylsilsesquioxane Propylene Glycol Dibenzoate Pseudozyma Epicola/Apricot Kernel Oil/Olive Fruit Oil/Sunflower Seed Oil/Sweet Almond Oil/(Angelica Gigas/Lithospermum Erythrorhizon) Root Pseudozyma Epicola/Apricot Kernel Oil/Olive Fruit Oil/Sweet Almond Oil/Sunflower Seed Oil/Licorice Root Extract Ferment Extract Filtrate Pseudozyma epicola/Camellia sinensis seed oil ferment extract filtrate Pseudozyma Epicola/Sunflower Seed Oil Ferment Extract Filtrate solanum lycopersicum (tomato) fruit extract Sorbitan Sesquioleate Squalane Taraxacum Officinale (Dandelion) Extract TOCOPHEROL Triethoxycaprylylsilane Trimethylsiloxysilicate

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Description

Ingredient & Allergen Review

SkinSAFE has reviewed the ingredients of Haus Labs Triclone Skin Tech Foundation, 280 Light Medium Neutral, 1 fl oz/30 mL and found it to be 91% Top Allergen Free and free of Gluten, Coconut, Nickel, Top Common Allergy Causing Preservatives, Lanolin, Paraben, Topical Antibiotic, MCI/MI, Soy, Irritant/Acid, and SLS. Product is Teen Safe.

Product Description

This proprietary formula delivers ultra-comfortable, longwear performance that’s suitable for all skin types, including sensitive and acne-prone. Its weightless, serum-like texture seamlessly blurs and smooths for a natural, luminous finish that wears all day.